The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 26, 2004
Filed:
Apr. 25, 2003
Oliver Genz, Dresden, DE;
Jurgen Preuninger, Wappingers Falls, NY (US);
Gerhard Kunkel, Radebeul, DE;
Infineon Technologies AG, Munich, DE;
Abstract
An apparatus ( ) for patterning the surface of a semiconductor wafer ( ). A stage ( ) is coupled to a motor ( ) that is adapted to move the stage ( ) and a semiconductor wafer ( ) in a horizontal direction at a first speed A. A mask ( ) is disposed above the semiconductor wafer ( ), the mask ( ) being coupled to a motor ( ) that is adapted to move the mask ( ) in a horizontal direction at a second speed B. The ratio of the first and second speeds is different than the magnification factor, which may be other than 1:1 if a lens ( ) is used. The mask ( ) and the wafer ( ) may be moved in the same horizontal direction simultaneously during the exposure process at different speeds B and A, respectively, to provide a magnification or demagnification of the mask ( ) pattern onto the wafer ( ) surface.