The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 26, 2004
Filed:
Jun. 19, 2002
Applicant:
Inventors:
Minh Van Ngo, Fremont, CA (US);
Robert A. Huertas, Hollister, CA (US);
Hieu Pham, Milpitas, CA (US);
Assignee:
Advanced Micro Devices, Inc., Sunnyvale, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 2/131 ; H01L 2/1469 ;
U.S. Cl.
CPC ...
H01L 2/131 ; H01L 2/1469 ;
Abstract
A silicon oxide layer is deposited at a thickness of about 50 Å or less by a multi-stage method comprising depositing a sub-layer of silicon oxide in each stage by PECVD at a low deposition rate. Embodiments include depositing a silicon dioxide liner over a gate electrode in at least four stages, each stage comprising depositing a sub-layer at a thickness of 10 Å or less.