The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 26, 2004
Filed:
Oct. 07, 2002
Applicant:
Inventors:
Yun-Hi Lee, Seoul, KR;
Byeong-Kwon Ju, Seoul, KR;
Yoon-Taek Jang, Seoul, KR;
Chang-Hoon Choi, Sungnam, KR;
Assignee:
Korea Institute of Science and Technology, Seoul, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 1/434 ; C23C 8/00 ; B05D 1/36 ;
U.S. Cl.
CPC ...
C23C 1/434 ; C23C 8/00 ; B05D 1/36 ;
Abstract
A fabrication method of metallic nanowires includes the steps of: forming a layer of autocatalytic metal with a thickness of 30 nm-1000 nm on the surface of a substrate; and forming nanowires on the front surface of the layer of autocatalytic metal, wherein the substrate is put into an evaporator and the layer of autocatalytic metal is grown by autocatalytic reaction for 10˜5000 seconds. A large amount of nanowires can be grown on a substrate without a lithography process.