The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 26, 2004
Filed:
Aug. 11, 2003
Kazuhiro Takeshita, Kumamoto, JP;
Shinji Nagashima, Kikuchi-gun, JP;
Yoji Mizutani, Kawasaki, JP;
Kyoshige Katayama, Kumamoto, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
A gas flow regulating surface portion is the farthest from the front surface of a wafer W in the middle between a peripheral portion of the wafer W and a center portion of a sealing vessel. The gas flow regulating portion protrudes to the front surface of the wafer W in the vicinity of a center portion that surrounds an exhausting opening . In other words, a convex portion is formed in a peripheral area of the gas flow regulating surface portion that surrounds the exhausting opening . Since treatment gas flows along the front surface of the gas flow regulating portion , treatment gas equally contacts the wafer W in the radius direction of the wafer W. Thus, a film with equal thickness is formed.