The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 26, 2004
Filed:
Mar. 29, 2002
Applicant:
Inventors:
Ho-Man Rodney Chiu, Mountain View, CA (US);
Eugene Smargiassi, San Jose, CA (US);
Steven Verhaverbeke, San Francisco, CA (US);
Brian H. Burrows, San Jose, CA (US);
Assignee:
Applied Materials, Inc., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B08B 3/02 ;
U.S. Cl.
CPC ...
B08B 3/02 ;
Abstract
A single wafer cleaning chamber that includes a rotatable bracket that can place a wafer beneath an upper end of a catch cup during a wafer cleaning process, a gutter positioned above a wafer transfer slit; where the catch cup can mate with the gutter to create a gap, and with the upper end of the catch cup positioned at a height equal to or higher than the gutter.
Chiu, Ho-Man. (2004). Gutter and splash-guard for protecting a wafer during transfer from a single wafer cleaning chamber (U.S. Patent No. 6807972). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6807972
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile