The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 19, 2004
Filed:
Mar. 10, 2003
Robert A. Soper, Plano, TX (US);
Texas Instruments Incorporated, Dallas, TX (US);
Abstract
Correcting a mask pattern includes partitioning the mask pattern to yield templates. The following is repeated for each template to generate correction data: a clip mask is generated for a template selected as a main template; the main template is merged with context templates to yield a merged template; the merged template is divided to yield segments including clip segments, where an intersection of the clip mask and the merged template defines an endpoint of a clip segment; a proximity correction procedure is performed on the segments to yield a corrected template; and correction data of the corrected template is selected according to the clip mask. The correction data for the templates are aggregated to correct the mask pattern.