The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 19, 2004
Filed:
Dec. 23, 2002
Hitoshi Okanda, Hachioji, JP;
Go Fujinawa, Hamura, JP;
Rigaku Corporation, Tokyo, JP;
Abstract
In the measurement with the focusing method, an X-ray beam from an X-ray source passes through an opening of a path-selection slit device and is narrowed by a divergence slit with a predetermined divergence angle and is thereafter incident upon a sample. The changing operation from the focusing method into the parallel beam method is carried out by turning, by 180 degrees, the path-selection slit device around its axis of rotation and by moving the divergence slit in a direction perpendicular to an X-ray traveling direction. Then, the X-ray beam from the X-ray source is reflected by a multilayer mirror to become a parallel beam and passes through the opening of the path-selection slit device and is thereafter incident upon the sample. Thus, the turning of the path-selection slit device enables the change between the focusing method and the parallel beam method, requiring no re-setting operation for the optical system.