The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 12, 2004
Filed:
Feb. 23, 2001
Kenichiro Mori, Utsunomiya, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
An exposure amount control method includes steps of illuminating an original with exposure light, emitted from a light source, through one or more light intensity uniforming optical systems, so that a pattern of the original illuminated is projected and printed on a substrate, measuring, by use of a first illuminance sensor, and illuminance of the exposure light as branched at a light source of the or one of the light intensity uniforming optical systems which is closest to the original, controlling an exposure amount of the substrate on the basis of a measurement output of the first illuminance sensor, measuring, by use of a second illuminance sensor, an illuminance at a position substantially conjugate with the substrate, and calibrating an output of the first illuminance sensor on the basis of a measurement output of the second illuminance sensor.