The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 12, 2004
Filed:
Apr. 24, 2003
Applicant:
Inventors:
Dun-Nian Yaung, Taipei, TW;
Sou-Kuo Wu, Hsin-Chu, TW;
Assignee:
Taiwan Semiconductor Manufacturing Co., Ltd, Hsin Chu, TW;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 2/100 ;
U.S. Cl.
CPC ...
H01L 2/100 ;
Abstract
A method for forming an optoelectronic product provides for forming a concave lensing layer registered with a photoactive region within a substrate. The concave lensing layer is formed employing an isotropic etching method. Registered in turn with a concavity with the concave lensing layer is a convex microlens layer formed over the concave lensing layer. The combination of the foregoing lensing layers provides the optoelectronic product with enhanced optical performance.