The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 6801823 B1

PDF
Full Text
Expired
Date of Patent:
Oct. 05, 2004

Filed:

Sep. 30, 2002
Applicant:
Inventor:

Masayoshi Mori, Hyogo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 1/900 ;
U.S. Cl.
CPC ...
G06F 1/900 ;
Abstract

Specification data including a method of measuring the dimension and mask design data for a photomask pattern is transmitted from an order-sender computer via a communication line. An element dimension calculating unit generates a measurement recipe according to the dimension-measurement method and the mask design data to transmit the measurement recipe to an element dimension measuring unit. The element dimension calculating unit calculates production error data of the pattern according to measurement data and the mask design data to transmit the error data to the order-sender via the communication line.


Find Patent Forward Citations

Mori, Masayoshi. (2004). Photomask supply system with photomask production period shortened (U.S. Patent No. 6801823). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6801823

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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