The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 05, 2004
Filed:
Sep. 10, 2003
Yoshiki Hirano, Fuchu, JP;
Yoshiro Shiokawa, Hachioji, JP;
Anelva Corporation, Fuchu, JP;
Abstract
A reflection type ion attachment mass spectrometry apparatus is provided with a metal ion generation region, an attachment region and a mass spectrometry region. The metal ion generation region and the mass spectrometry region are formed as a common compartment and the attachment region is provided adjoining the common compartment. The attachment region has an electrostatic field generation unit for forming an electrostatic field in order to reflect the metal ions introduced from the metal ion generation region so as to guide them to the mass spectrometry region. Thereby, a trace ingredient can be detected with a high measurement sensitivity, the problems of disturbance of the mass spectrometer, deterioration of the metal ion emitter, the size of the apparatus, direct sampling, etc. are solved, and broad use in industry is possible.