The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 05, 2004
Filed:
Jun. 18, 2002
Applicant:
Inventors:
Pierre Leroux, San Antonio, TX (US);
David Ziger, San Antonio, TX (US);
Assignee:
Koninklijke Philips Electronics N.V., Eindhoven, NL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 9/00 ;
U.S. Cl.
CPC ...
G03F 9/00 ;
Abstract
A technique is provided to define a pattern ( ) on a substrate ( ) that includes a dense region with a number of features ( ) and an isolated feature region comprised of at least a part of one of the features ( ). The dense feature region has a greater feature density than the isolated feature region. A reference feature ( ) is measured at a number of different points relative to the isolated feature region and the dense feature region with a measurement tool ( ). An iso-dense effect is determined from these measurements.