The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 6798006 B1

PDF
Full Text
Expired
Date of Patent:
Sep. 28, 2004

Filed:

Jun. 06, 2003
Applicant:
Inventors:

Atsushi Amo, Tokyo, JP;

Atsushi Hachisuka, Tokyo, JP;

Tatsuo Kasaoka, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 2/7108 ;
U.S. Cl.
CPC ...
H01L 2/7108 ;
Abstract

A semiconductor device includes a diffusion region in a semiconductor substrate, a gate insulation film on the semiconductor substrate, a gate electrode on the gate insulation film, an interlayer insulation film on the semiconductor substrate covering the gate electrode, and a capacitor on the interlayer insulation film. The capacitor includes a laminated structure made up of a lower electrode, a dielectric film, and an upper electrode. The diffusion region, the gate electrode, and the lower electrode are connected to one another by a common contact in the interlayer insulation film.


Find Patent Forward Citations

Amo, Atsushi. (2004). Semiconductor device and manufacturing method thereof (U.S. Patent No. 6798006). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6798006

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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