The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 21, 2004
Filed:
Aug. 21, 2002
Saikumar Jayaraman, Twinsburg, OH (US);
George Martin Benedikt, Solon, OH (US);
Larry Funderburk Rhodes, Silver Lake, OH (US);
Richard Vicari, Strongsville, OH (US);
Robert David Allen, San Jose, CA (US);
Richard Anthony DiPietro, San Jose, CA (US);
Ratnam Sooriyakumaran, San Jose, CA (US);
Thomas Wallow, Union City, CA (US);
Other;
Abstract
The present invention relates to cyclic polymers and their use in photolithographic applications. The cyclic polymers contain a pendant acid labile functional group and a functional group containing a protected hydroxyl moiety. The polymers are post modified by deprotecting the pendant hydroxyl moiety and reacting the deprotected hydroxyl containing moiety with a coreactant. The post-functionalized polymers find application in chemically amplified photoresist compositions.