The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 21, 2004
Filed:
Feb. 12, 2002
Applicant:
Inventor:
Mark W. Miles, San Francisco, CA (US);
Assignee:
Iridigm Display Corporation, San Francisco, CA (US);
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F 7/00 ; G03F 7/26 ;
U.S. Cl.
CPC ...
G03F 7/00 ; G03F 7/26 ;
Abstract
The invention provides a microfabrication process which may be used to manufacture a MEMS device. The process comprises depositing one or a stack of layers on a base layer, said one layer or an uppermost layer in said stack of layers being a sacrificial layer; patterning said one or a stack of layers to provide at least one aperture therethrough through which said base layer is exposed; depositing a photosensitive layer over said one or a stack of layers; and passing light through said at least one aperture to expose said photosensitive layer.
Published as:
US2003152872A1; WO03069413A1; AU2002256386A1; US6794119B2; KR20040091034A; EP1485758A1; CN1623122A; US2005142684A1; JP2005520694A; EP1485758A4; US7250315B2; US2008026328A1; CN100401192C; CN101284643A; JP2008290243A; EP1485758B1; ATE419561T1; DE60230680D1; EP2042466A2; EP2042466A3; US7642110B2; KR100947813B1; JP4633362B2; CN101284643B; JP5031693B2;