The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 14, 2004

Filed:

Dec. 29, 2000
Applicant:
Inventors:

Robert J. O'Donnell, Alamada, CA (US);

Christopher C. Chang, Sunnyvale, CA (US);

John E. Daugherty, Alamada, CA (US);

Assignee:

LAM Research Corporation, Fremont, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 2/100 ; H01L 2/164 ;
U.S. Cl.
CPC ...
H01L 2/100 ; H01L 2/164 ;
Abstract

A corrosion resistant component of semiconductor processing equipment such as a plasma chamber includes a fullerene containing surface and process for manufacturing thereof.


Find Patent Forward Citations

O'Donnell, Robert. (2004). Fullerene coated component of semiconductor processing equipment and method of manufacturing thereof (U.S. Patent No. 6790242). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6790242

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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