The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 07, 2004

Filed:

Jul. 23, 2003
Applicant:
Inventors:

Andre Jeunink, Bergeyk, NL;

Frank Commissaris, Waalre, NL;

Vera Lemmen, Eindhoven, NL;

Assignee:

ASML Netherlands BVV., Veldhoven, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 2/742 ;
U.S. Cl.
CPC ...
G03B 2/742 ;
Abstract

The change in a property of a lithographic apparatus, in a preferred embodiment the change in magnification of the projection system due to lens heating effects, is predicted and when the change since the last time an alignment process was performed is greater than a threshold, an additional alignment process is carried out. A realignment is triggered when the predictive correction, and hence the error in it, becomes larger than a desired maximum. This avoids unnecessary realignments but ensures that an alignment does occur when likely errors are out of permitted ranges.


Find Patent Forward Citations

Jeunink, Andre. (2004). Lithographic apparatus, device manufacturing methods, and computer-readable storage medium (U.S. Patent No. 6788383). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6788383

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Loading…