The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 31, 2004

Filed:

Jun. 17, 2002
Applicant:
Inventors:

Lawrence D. Rotter, Pleasanton, CA (US);

David Wang, Fremont, CA (US);

Assignee:

Therma-Wave, Inc., Fremont, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 2/121 ;
U.S. Cl.
CPC ...
G01N 2/121 ;
Abstract

One aspect of the present invention relates to a system and method for mitigating errors in SE data in order to determine changes in a polarization state of a source beam after interaction with a specimen. The system includes a light source for directing a source beam to a focusing optical element, a polarization system comprising a diffractive optical element or a wire grid polarizer, located between the focusing optical element and the specimen such that the source beam is polarized after being reflected from the focusing optical element. The polarized source beam is transmitted to the specimen. Changes in polarization state of the beam created by interaction with the sample are monitored to characterize the sample.


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