The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 24, 2004
Filed:
Jun. 03, 2002
Applicant:
Inventor:
Dan Rittman, Foster City, CA (US);
Assignee:
DuPont Photomasks, Inc., Round Rock, TX (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06F 1/750 ; G06F 9/45 ;
U.S. Cl.
CPC ...
G06F 1/750 ; G06F 9/45 ;
Abstract
A photomask and method for eliminating design rule violations from the photomask are disclosed. A photomask includes a substrate and a patterned layer formed on at least a portion of the substrate. The patterned layer may be formed using a mask pattern file created by comparing a feature dimension in a mask layout file with a design rule in a technology file, identifying a design rule violation if the feature dimension is less than the design rule and automatically correcting the identified design rule violation in the mask layout file.