The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 24, 2004
Filed:
Jun. 26, 2002
Applicant:
Inventors:
Dan Rittman, Foster City, CA (US);
Micha Oren, Cupertino, CA (US);
Assignee:
DuPont Photomasks, Inc., Round Rock, TX (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06F 1/750 ;
U.S. Cl.
CPC ...
G06F 1/750 ;
Abstract
A system and method for eliminating design rule violations during construction of a mask layout block are disclosed. The method includes analyzing a selected position for a polygon in a mask layout block and obtaining one or more design rules associated with the polygon from a technology file. The method provides a hint area associated with the selected position for the polygon that graphically represents a space in the mask layout block where the selected position complies with the design rule violation.