The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 24, 2004
Filed:
Jan. 11, 2002
Franklin Dean Kalk, Austin, TX (US);
DuPont Photomasks, Inc., Round Rock, TX (US);
Abstract
The present disclosure describes an Alternating Aperture Phase Shifting (AAPS) photomask with improved transmission balance. The method includes forming an alternating aperture phase shifting photomask pattern on a substrate, including forming trenches within the substrate. The method further includes forming a transmission balancing layer over the substrate. More particularly, the method includes forming the transmission balancing layer from a material having a higher index of refraction than the substrate. In one embodiment the transmission balancing layer may be formed from spin on glass (SOG). Another embodiment of the invention may include an enhanced AAPS photomask fabricated according to the above method.