The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 24, 2004

Filed:

Apr. 10, 2001
Applicant:
Inventors:

Holger Eggers, Freiburg, DE;

Andreas Gasse, Walsrode, DE;

Gregor Kaschel, Bomlitz, DE;

Rainer Brandt, Walsrode, DE;

Bernd Eilers, Bomlitz, DE;

Assignee:

Wolff Walsrode AG, Walsrode, DE;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B32B 2/734 ;
U.S. Cl.
CPC ...
B32B 2/734 ;
Abstract

Described is a single or multi-layered film having at least one polyamide layer (I) containing dispersed nanoscale nucleating particles. The smallest components of the dispersed nanoscale nucleating particles in layer (I) have an extension of less than 100 nm in at least one randomly selected direction for each component, based on a weighted average of all components of the dispersed nanoscale nucleating particles. Crystalline structures emanating from the surface of the dispersed nanoscale nucleating particles are formed after the layer (I) is cooled from the molten state at a rate of from 10 to 20° C. per minute. The dispersed nanoscale nucleating particles are present in the polyamide layer (I) in an amount of from 10 ppm to 3000 ppm, based on the total weight of layer (I).


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