The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 24, 2004

Filed:

Jul. 03, 2001
Applicant:
Inventors:

Tomishi Shibano, Saitama, JP;

Toru Nakamura, Saitama, JP;

Assignee:

Lintec Corporation, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B29C 3/510 ; B29C 5/514 ; B29C 5/916 ; B29C 7/104 ;
U.S. Cl.
CPC ...
B29C 3/510 ; B29C 5/514 ; B29C 5/916 ; B29C 7/104 ;
Abstract

There is disclosed a process for inline producing a biaxially oriented releasing film by consecutively orienting a non oriented film (polyethylene terephthalate or polypropylene) in the machine or transverse direction one by one which comprises coating at least one side of a film in a state prior to biaxial orientation with an addition reaction type silicone based releasing agent (e.g. solvent type), preferably incorporated with a photosensitizer; biaxially orienting the film; thereafter heat annealing the same; and subsequently performing ultraviolet ray irradiation. The process enables easy production of the releasing film which is excellent in releasability, non-migration property of silicone, and productivity, and which is well suited for use in the production of pressure sensitive adhesive labels and tapes, ceramic green sheets, synthetic leather, etc.


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