The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 6775575 B1

PDF
Full Text
Expired
Date of Patent:
Aug. 10, 2004

Filed:

Feb. 26, 2002
Applicant:
Inventors:

D. Bommi Bommannan, Los Altos, CA (US);

Michael D. Laufer, Menlo Park, CA (US);

Assignee:

Other;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
A61F 2/00 ; A61B 1/818 ;
U.S. Cl.
CPC ...
A61F 2/00 ; A61B 1/818 ;
Abstract

Systems and methods for reducing or minimizing post-surgical complications are described. By applying energy to tissues under specifically controlled conditions, the formation of adhesions in response to cutting or other damage of those tissue may be eliminated or significantly reduced. According to an embodiment of the method of the invention, energy application is controlled to heat the tissue within a range of 61 to 100 degrees centigrade. In one embodiment, the system of the invention includes an easily manipulated applicator, having a scissor-like configuration and a controller for the energy application.

Published as:
WO02067798A1; US2002183734A1; US6775575B2;

Find Patent Forward Citations

Bommannan, D.. (2004). System and method for reducing post-surgical complications (U.S. Patent No. 6775575). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6775575

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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