The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 03, 2004

Filed:

Aug. 02, 2001
Applicant:
Inventor:

Lucius M. Sherwin, Plano, TX (US);

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01N 2/100 ; G01N 1/00 ; G01N 1/14 ; A47L 9/02 ; A47L 1/00 ;
U.S. Cl.
CPC ...
G01N 2/100 ; G01N 1/00 ; G01N 1/14 ; A47L 9/02 ; A47L 1/00 ;
Abstract

A portable particle detection and removal system ( ) that connects to a house vacuum ( ). A particle sensor ( ) is connected between two hoses: one ( ) connected to the house vacuum ( ) and one ( ) for vacuuming the wafer equipment chamber. A smaller diameter hose ( ) may be used for vacuuming the wafer equipment chamber. The particle sensor detects ( ) incoming particles and a particle count is displayed for the operator. A modulated cleaning system ( ) modulates the vacuum pressure in the second hose ( ) between two vacuum pressure states.


Find Patent Forward Citations

Sherwin, Lucius. (2004). Particle detection and removal apparatus for use on wafer fabrication equipment to lower tool related defects from particle contamination (U.S. Patent No. 6771371). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6771371

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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