The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 03, 2004

Filed:

Jun. 11, 2002
Applicant:
Inventors:

Taylor R. Efland, Richardson, TX (US);

David A. Grant, Dallas, TX (US);

Ramanathan Ramani, Richardson, TX (US);

Chin-Yu Tsai, HsinChu Seien, TW;

Dale Skelton, Plano, TX (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 2/701 ;
U.S. Cl.
CPC ...
H01L 2/701 ;
Abstract

An array ( ) of transistors ( ) formed in a p-type layer ( ), and including a second heavily doped p-type region ( ) laterally extending proximate the drain of each transistor to collect minority carriers of the transistors. A deep n-type region ( ) is formed in the p-type layer ( ) and proximate a n-type buried layer ( ) together forming a guardring about the drain regions of the plurality of transistors. The array of transistors may be interconnected in parallel to form a large power FET, whereby the heavily doped second p-type region ( ) reduces the minority carrier lifetime proximate the drains of the transistors. The guardring ( ) collects the minority carriers (T ) and is isolated from the drains of the transistors. Preferably, the transistors are formed in a P-epi tank that is isolated by the guardring. The P-epi tank is preferably formed upon a buried NBL layer, and the deep n-type region is an N well extending to the buried NBL layer. The guardring is preferably grounded when utilized as the low side transistor to collect minority carriers.


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