The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 03, 2004
Filed:
Feb. 02, 2001
Zion Koren, Sunnyvale, CA (US);
Yorkman Ma, San Jose, CA (US);
Rudy Santo Tomas Cardema, San Jose, CA (US);
James Tsuneo Taoka, San Jose, CA (US);
Lois Wride, Valley View, AU;
Craig McFarland, Calgary, CA;
Shawn Gibson, Calgary, CA;
Mattson Technology, Inc., Fremont, CA (US);
Abstract
The present invention is generally directed to a system and process for rotating semiconductor wafers in thermal processing chambers, such as rapid thermal processing chambers and chemical vapor deposition chambers. In accordance with the present invention, a semiconductor wafer is supported on a substrate holder which, in turn, is supported on a rotor. During processing, the rotor is magnetically levitated and magnetically rotated by suspension actuators and rotation actuators positioned outside of the chamber.