The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 27, 2004
Filed:
Sep. 14, 2001
Applicant:
Inventors:
Jonathan B. Buckheit, Foster City, CA (US);
Weidong Wang, Union City, CA (US);
Assignee:
Yield Dyamics, Inc., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06F 3/00 ;
U.S. Cl.
CPC ...
G06F 3/00 ;
Abstract
A system and method for analyzing error information from a semiconductor fabrication process. The system receives wafer map data describing a plurality of failing chips on a particular semiconductor wafer. The system utilizes the wafer map data to classify each of the failing chips into one of several error categories, such systematic errors, repeated or reticle errors, and random errors. The system further partitions the systematic errors into spatial clusters, which may be compared against a known library of spatial error patterns for identifying the origins of the systematic errors.