The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 27, 2004

Filed:

Jul. 02, 2003
Applicant:
Inventors:

Yoshiki Hirano, Tokyo, JP;

Yoshiro Shiokawa, Tokyo, JP;

Toshihiro Fujii, Tokyo, JP;

Munetaka Nakata, Tokyo, JP;

Masao Takayanagi, Tokyo, JP;

Assignee:

Anelva Corporation, Fuchu, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 4/900 ;
U.S. Cl.
CPC ...
H01J 4/900 ;
Abstract

An ion attachment mass spectrometry apparatus provided with a first chamber and a second chamber separated by a partition having an aperture (nozzle), an emitter, a mass spectrometer, a vacuum pump, and a sample gas introduction mechanism for introducing a sample gas and making metal ions attach to sample gas molecules to make the sample gas positive ions. Further, the Knudsen number of the aperture is made not more than 0.01, the pressure of the second chamber is not more than {fraction (1/10)}th of the first chamber, gas of the sample gas in the first chamber is blown out from the aperture to the second chamber, and a supersonic jet formed in the second chamber is provided. Sample gas and metal ions are injected into the supersonic jet region and metal ions are made to attach to the sample gas molecules.


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