Method for forming antifuse via structure

Abstract

The present invention provides a method for forming an antifuse via structure. The antifuse via structures comprising a substrate that having a first conductive wire therein. Then, a first dielectric layer is formed on the substrate, and a photoresist layer is formed on the first dielectric layer. Next, an etching process is performed to etch the first dielectric layer to form a via open in the first dielectric layer. Then, a first conductive layer is deposited to fill the via open and performing a polishing process to form a conductive plug, wherein the conductive plug is on the first conductive wire. Next, a buffer layer deposited on the partial first dielectric layer and on the surface of conductive plug. Then, another polishing process is performed to the buffer layer to expose the portion of the conductive plug. Thereafter, a first electrode of capacitor is deposited on the buffer layer. Next, a second dielectric layer is formed on the first electrode and an intentionally misaligned process is performed to second dielectric layer to form an antifuse via open, such that the breakdown will be occurred on the corner of the first via, wherein the antifuse via open intentionally misaligned to the conductive plug. Then, a third dielectric layer and a second electrode of the capacitor are subsequently formed on the portion of the second dielectric layer and on sidewall of the antifuse via open. Finally, a second conductive wire is formed on the second electrode.