The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 20, 2004
Filed:
Sep. 08, 2000
Applicant:
Inventor:
Hikaru Yoshitaka, Fuchu, JP;
Assignee:
Tokyo Electron Limited, Tokyo-to, JP;
Primary Examiner:
Int. Cl.
CPC ...
H01L 2/14763 ; H01L 2/1461 ;
U.S. Cl.
CPC ...
H01L 2/14763 ; H01L 2/1461 ;
Abstract
A hard mask of SiCN is formed on a fluorine-containing carbon film . Thus, the adhesion of the hard mask to the fluorine-containing carbon is improved and inhibited from being peeled off. The hard mask of SiCN can hare a higher etch-selectivity than those of conventional hard masks, and can have a lower dielectric constant than that of SiN or SiC.