The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 20, 2004
Filed:
Jul. 18, 2002
Applicant:
Inventors:
Habib Hichri, Wappingers Falls, NY (US);
Kelly Malone, Poughkeepsie, NY (US);
Arthur Martin, Glenham, NY (US);
Assignee:
International Business Machines Corporation, Armonk, NY (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 5/140 ; C23C 1/600 ;
U.S. Cl.
CPC ...
H01L 5/140 ; C23C 1/600 ;
Abstract
A semiconductor wafer provided with a thermosetting porous insulating film, wherein the insulating film is made porous, cured and polymerized on the wafer. The film is characterized by a very low dielectric constant based on its constituency and porosity, the latter property of which is caused by the inclusion of liquid or supercritical carbon dioxide in the polymeric reaction mixture.
Hichri, Habib. (2004). Semiconductor wafer including a low dielectric constant thermosetting polymer film and method of making same (U.S. Patent No. 6764873). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6764873
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile