The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 20, 2004
Filed:
Aug. 22, 2002
Thomas J. Aton, Dallas, TX (US);
Robert A. Soper, Plano, TX (US);
Texas Instruments Incorporated, Dallas, TX (US);
Abstract
A method and system for mask pattern correction are disclosed. A portion of a mask pattern is segmented into segments ( ) that include a base segment ( ) and a relational segment ( ). The relational segment ( ) is matched with the base segment ( ). A proximity correction is determined for the base segment ( ), and a critical dimension correction is determined for the relational segment ( ). The critical dimension correction is determined with respect to the proximity correction of the matching base segment ( ).
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