The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 13, 2004
Filed:
Sep. 12, 2001
Osamu Nozawa, Fuchu, JP;
Masaru Mitsui, Yamanashi-ken, JP;
Hitoshi Ootsuka, Tokyo, JP;
Hideaki Mitsui, Fuchu-shi, JP;
Hoya Corporation, , JP;
Abstract
There is provided a manufacturing apparatus and method able to manufacture a phase shift mask blank in which a total number of particles and pinholes having a diameter larger than about a half of an exposure wavelength in a light semi-transmission film is 0.1 or less per square centimeter. In a DC magnetron sputtering apparatus for manufacturing a halftone phase shift mask blank, for example, a target plane is disposed downwards with respect to a gravity direction, a whole-surface erosion cathode is used, a corner portion of an end of a target and a corner portion of an earth shield are chamfered (R processed), a target end , an exposed backing plate surface and the surface of an earth shield are roughened, and the earth shield is disposed above a target plane d (on a backing plate side).