The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 22, 2004
Filed:
Aug. 02, 2001
Yen-Ting Lu, Taichung, TW;
Macronix International Co., Ltd., Hsin-Chu, TW;
Abstract
A method for reducing line edge roughness of patterned photoresist, include at least: provide a patterned photoresist which has at least a trench and is located on a substrate; fill trenches so let that trenches are totally filled by an additional material, wherein the additional material is easily to bond with the patterned photoresist; remove part of the additional material which is located on patterned photoresist and the substrate; and treat the additional material so let that adhesion between the additional material and patterned photoresist is enhanced after the additional material is treated. Moreover, while only trenches are filled by the additional material, step of removing part of the additional material could be omitted; while adhesion between the additional material and patterned photoresist is good, step of treating the additional material could be omitted.