The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 15, 2004

Filed:

Mar. 12, 2002
Applicant:
Inventor:

Soo-Young Oh, Fremont, CA (US);

Assignee:

Ubitech, Inc., San Jose, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 1/750 ;
U.S. Cl.
CPC ...
G06F 1/750 ;
Abstract

Systems and methods for limiting capacitance increase due to dummy fill metals utilized to improve planar profile uniformity are disclosed. A computer-automated method for locating dummy fills in an integrated circuit fabrication process generally comprises reading a layout file specifying layout of the integrated circuit, designating at least one net of the integrated circuit as a critical net, the critical nets being only a subset of all nets of the integrated circuit, identifying metal conductors corresponding to each designated critical net from the layout file, delineating a net blocking exclusion zone extending a distance of a minimum net blocking distance (NBD) from the metal conductor for each metal conductor identified, and locating the dummy fills outside of the net blocking exclusion zone.


Find Patent Forward Citations

Quick Actions:

Oh, Soo-Young. (2004). System and method for limiting increase in capacitance due to dummy metal fills utilized for improving planar profile uniformity (U.S. Patent No. 6751785). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6751785

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Loading…