The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 08, 2004
Filed:
Oct. 31, 2001
Applicant:
Inventors:
Ernst-Christian Richter, Erlangen, DE;
Michael Sebald, Weisendorf, DE;
Assignee:
Infineon Technologies AG, Munich, DE;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03C 5/56 ;
U.S. Cl.
CPC ...
G03C 5/56 ;
Abstract
A method structures a chemical amplification photoresist layer, in which a photoresist layer of the chemically amplified type is brought into contact, before or after the exposure for structuring, with a base which is capable of diffusing into the photoresist layer. As a result of this treatment with the base, greater steepness and less roughness of the resist profiles are achieved in the subsequent development step.