The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 01, 2004
Filed:
Oct. 09, 2002
Shinya Watanabe, Tokyo, JP;
Shunji Yasumura, Tokyo, JP;
Renesas Technology Corp., Tokyo, JP;
Abstract
An interlayer insulation film ( ) on a plug ( ) is etched using a silicon nitride film ( ) used in pattern etching of a bit line ( ) as a hard mask such that the plug ( ) projects into a groove ( ). Another silicon nitride film ( ) is provided to cover an exposed surface of the groove ( ), the bit line ( ) and the silicon nitride film ( ), thereby forming another interlayer insulation film ( ) on the silicon nitride film ( ) to fill the groove ( ). The silicon nitride films ( ) are used as an etching stopper to etch the interlayer insulation film ( ) above the plug ( ). The silicon nitride film ( ) on the plug ( ) is etched to expose the plug ( ) into a recess.