The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 25, 2004
Filed:
Feb. 06, 2002
Applicant:
Inventors:
Marcus Emile Joannes Boonman, Veldhoven, NL;
Johannes Catharinus Hubertus Mulkens, Maastricht, NL;
Hans Butler, Best, NL;
Assignee:
ASML Netherlands B.V., Veldhoven, NL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 2/754 ; G03B 2/742 ; G03B 2/732 ; G03B 2/752 ;
U.S. Cl.
CPC ...
G03B 2/754 ; G03B 2/742 ; G03B 2/732 ; G03B 2/752 ;
Abstract
In a lithographic apparatus the shape of the focal plane is adjusted using available manipulators in the projection lens system so that it is in closer conformity to the shape of the wafer surface in the exposure area. The control of the focal plane shape can be integrated with the leveling control which determines the height and tilt of the wafer surface.