The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 25, 2004

Filed:

May. 14, 2003
Applicant:
Inventors:

Mitsuyoshi Sato, Chiba, JP;

Akira Yonezawa, Chiba, JP;

Seiji Morita, Chiba, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J 3/14 ; H01J 3/7244 ; H01J 3/728 ; H01J 4/900 ;
U.S. Cl.
CPC ...
H01J 3/14 ; H01J 3/7244 ; H01J 3/728 ; H01J 4/900 ;
Abstract

In order to ensure that an electromagnetic field lens is capable of high-resolution observation using a magnetic field lens without leakage of magnetic flux, there is provided a magnetic field superimposing-type lens for focusing an electron beam onto a sample so as to irradiate the sample is provided with an upper magnetic pole a long way from the sample and a lower side magnetic pole close to the sample , with electrical insulation being provided between the upper magnetic pole and the lower magnetic pole by a ferrite insulator provided between the upper magnetic pole and the lower magnetic pole in an integral manner with the magnetic poles so that the upper magnetic pole and the lower magnetic pole may be held at different potentials. There is therefore no leak in flux from between the upper magnetic pole and the lower-magnetic pole , the chromatic aberration coefficient Cc can be made small, and high-resolution observation of the sample can be achieved.


Find Patent Forward Citations

Loading…