The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 25, 2004
Filed:
Oct. 31, 2002
Applicant:
Inventor:
Alexander Leybovich, Hilliard, OH (US);
Assignee:
Tosoh SMD, Inc., Grove City, OH (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01N 2/904 ;
U.S. Cl.
CPC ...
G01N 2/904 ;
Abstract
An improved method and apparatus for non-destructive cleanliness evaluation in sputter targets using radio frequency waveform phase change and amplitude detection is disclosed. The apparatus acquires phase change and amplitude for a plurality of data points. The method disclosed for characterizing the sputter target material ( ) employs the phase change and amplitude magnitude data for calculating cleanliness factors and generating pareto histograms.
Leybovich, Alexander. (2004). Cleanliness evaluation in sputter targets using phase (U.S. Patent No. 6739196). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6739196
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile