The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 18, 2004
Filed:
Jul. 28, 2000
Yoshikazu Sakaue, Tokyo, JP;
Toshiya Ijichi, Tokyo, JP;
Renesas Technology Corp., Tokyo, JP;
Abstract
A notch inspection method based on shading pattern matching for inspecting notches on semiconductor packages or like objects. A template is created to characteristically express brightness gradations of a notch edge in a picture, i.e., to represent the notch edge in pixels constituting contiguous bright and dark portions of the edge. The template may be created on the basis of notch size information or notch size measurements. The template is checked against pictures under inspection in shading pattern matching whereby presence of a notch is determined. Computations of shading pattern matching are omitted regarding portions of the notch edge where brightness remains unchanged.