The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 18, 2004
Filed:
May. 28, 2002
Roy D. McGregor, El Camino Village, CA (US);
Robert A. Bunnell, Redondo Beach, CA (US);
Michael B. Petach, Redondo Beach, CA (US);
Rocco A. Orsini, Long Beach, CA (US);
Northrop Grumman Corporation, Redondo Beach, CA (US);
Abstract
A target material delivery system in the form of a nozzle ( ) for an EUV radiation source ( ). The nozzle ( ) includes a target material supply line ( ) having an orifice ( ) through which droplets ( ) of a liquid target material ( ) are emitted, where the droplets ( ) have a predetermined size, speed and spacing therebetween. The droplets ( ) are mixed with a carrier gas ( ) in a mixing chamber ( ) enclosing the target material chamber ( ) and the mixture of the droplets ( ) and the carrier gas ( ) enter a drift tube ( ) from the mixing chamber ( ). The droplets ( ) are emitted into an accelerator chamber ( ) from the drift tube ( ) where the speed of the droplets ( ) is increased to control the spacing therebetween. A vapor extractor ( ) can be mounted to the accelerator chamber ( ) or the drift tube ( ) to remove the carrier gas ( ) and target material vapor, which would otherwise adversely affect the EUV radiation generation.