The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 18, 2004
Filed:
May. 26, 1999
Applicant:
Inventor:
Kazuya Kamon, Tokyo, JP;
Assignee:
Renesas Technology Corp., Tokyo, JP;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F 9/00 ; G03C 5/00 ;
U.S. Cl.
CPC ...
G03F 9/00 ; G03C 5/00 ;
Abstract
A photomask fabricated by a photomask fabrication method has a transparent substrate ( ), a shade pattern ( ) formed in a hollow section ( ), and a phase shift pattern ( ) having a flat surface that is selectively formed on the transparent substrate ( ) and the shield pattern ( ).
Quick Actions:
Kamon, Kazuya. (2004). Photomask, fabrication method of photomask, and fabrication method of semiconductor integrated circuit (U.S. Patent No. 6737198). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6737198
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile