The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 11, 2004
Filed:
Aug. 13, 2002
Applicant:
Inventor:
Ming Li, Hsinchu, TW;
Assignee:
Taiwan Semiconductor Manufacturing Co., Ltd., Hsin-Chu, TW;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J 3/7317 ;
U.S. Cl.
CPC ...
H01J 3/7317 ;
Abstract
An electron filter for trapping dissociated electrons in an ion implantation chamber. The electron filter typically includes at least one filter element which is connected to a voltage source for applying a positive voltage to the filter element. During an ion implantation process, dissociated electrons are drawn from the interior of the chamber and trapped in the filter element to prevent or reduce contamination of the substrates.