The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 04, 2004
Filed:
Nov. 08, 2001
Applicant:
Inventor:
Tetsuro Hanawa, Kanagawa, JP;
Assignee:
Semiconductor Leading Edge Technologies, Inc., Kanagawa, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03B 2/754 ;
U.S. Cl.
CPC ...
G03B 2/754 ;
Abstract
In the present invention, a substrate with exposure light from an exposure light source is irradiated before a projection exposure beforehand. A reflectance of this exposure light from the substrate is measured. An appropriate intensity of exposure light for the substrate is determined by referring to the reflectance. Then, a mask pattern is projected onto the substrate by irradiating with exposure light of the determined intensity.
Hanawa, Tetsuro. (2004). Projection aligner, exposing method and semiconductor device (U.S. Patent No. 6731375). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6731375
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile