The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 27, 2004
Filed:
Jun. 06, 2002
Applicant:
Inventors:
Jinlian Hu, Hung Hom, HK;
Binjie Xin, Hung Hom, HK;
Yueyang Guo, Hung Hom, HK;
Edward Newton, Hung Hom, HK;
Assignee:
The Hong Kong Polytechnic University, Hung Hom, HK;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01B 1/130 ;
U.S. Cl.
CPC ...
G01B 1/130 ;
Abstract
A system for analyzing fabric surface appearance includes a feed mechanism for running a fabric over a crest including a frame for holding the fabric bent to form a crest, an image capturing device for capturing profile images of the fabric surface at the crest, and a computer system for manipulating the images. The computer system produces a three-dimensional representation of the fabric surface and identifies characteristics in the three-dimensional representation. The information is compared to reference data to identify a grade for the fabric.