The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 27, 2004
Filed:
Jan. 10, 2001
Unryu Ogawa, Tokyo, JP;
Takayuki Sato, Tokyo, JP;
Hitachi Kokusai Electric Inc., Tokyo, JP;
Abstract
The invention provides a plasma processing apparatus, in which the uniformity of the plasma density can be improved, and the electron temperature can be kept low. A vacuum vessel for generating a plasma includes an upper vessel that is dome-shaped and formed in one seamless piece, and a lower vessel fastened tightly on a lower aperture portion of the upper vessel with a sealing member. The plasma processing apparatus is provided with a supply port for supplying gas to the vacuum vessel and an exhaust port for exhausting gas. An electrode for applying high-frequency power to ionize the gas is provided not in the vacuum vessel but in ring-shape outside the vacuum vessel . On the outer side of this tubular electrode , a pair of tubular magnets are provided, which form magnetic force lines that intersect perpendicularly with the electric field.