The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 27, 2004

Filed:

Jul. 24, 2002
Applicant:
Inventors:

Hun Lin, Hualien, TW;

Tien-Chen Hu, Pingtung, TW;

Tso-Hsu Lin, Taichung, TW;

Hong-Chin Pu, Pingtung, TW;

Jeng-Fang Chang, Pingtung, TW;

Der-Yuan Hong, Tainan, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B24B 2/100 ;
U.S. Cl.
CPC ...
B24B 2/100 ;
Abstract

A tensioning assembly for a polishing belt on a linear chemical mechanical polishing apparatus. The tensioning assembly comprises first and second rollers which are operably engaged by respective air cylinders and exert a selected degree of downward tension on the lower run of the horizontal polishing belt. A third roller biased typically by a spring pushes upwardly on the lower run of the belt between the first and second rollers. Accordingly, the first and second rollers, in conjunction with the third roller, tension the belt on the apparatus to maintain optimum material removal rates and uniformity. The degree of tension exerted on the belt can be varied according to stretching of the belt resulting from prolonged use.


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