The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 20, 2004

Filed:

Dec. 31, 2002
Applicant:
Inventors:

Andrew Daiber, Redwood City, CA (US);

Jiann-Chang Lo, Cupertino, CA (US);

Paul Chi-Hwa Lin, San Jose, CA (US);

Assignee:

Intel Corporation, Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01S 3/04 ;
U.S. Cl.
CPC ...
H01S 3/04 ;
Abstract

A tunable external cavity laser apparatus and method of laser operation. The apparatus includes a gain medium having first and second facets defining a facet laser cavity in which a first portion of light is internally reflected to produce a first lasing condition having a first reflection phase. A reflective element is positioned opposite the second facet of the gain medium, forming an external laser cavity defined by the first facet and reflective element. A second portion of light is internally reflected within the external cavity to produce a second lasing condition having a second reflection phase. A phase adjustment means is employed to adjust the first reflection phase relative to the second reflection phase so as to control a characteristic of the output beam emitted from the apparatus, such as the power output level of the beam. In one aspect, the relative phase is adjusted by controlling the temperature of the gain medium.


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